Process Modeling

Publications: 1999 1998 1997 1996 1995 1994 1993

---

1999

Modelling Calibration and Validation of Contributions to Stress in the STI Process Sequence (MSM '99 - April 1999)
-Garikipati, Rao, Hao, Ibok, De Wolf, Dutton

• Text {PDF}

Back to the Top

1998

A Common Mesh Implementation for Both Static and Moving Boundary Process Simulations (SISPAD 1998 - Sept. 1998)
- Chen, Yergeau, Dutton

• Text {POSTSCRIPT, PDF}

Back to the Top

1997

A New Numerical Formulation for Thermal Oxidation (SISPAD '97 - Sept. 1997)
-Rao, Hughes, Kan, Dutton

Next-Generation TCAD Tools--Supporting Rapid Prototyping of New Models and Numerics (1997 NASA Device Modeling Workshop - Aug. 1997)
- Dutton, Kan, Yergeau, Yu, Rafferty

• Text {POSTSCRIPT, PDF}

Back to the Top

1996

Accurate Doping Profile Determination Using TED/QM Models Extensible to Sub-quarter Micron nMOSFETs (IEDM '96 - Dec. 1996)
-Voorde, Griffin, Yu, Oh, Dutton

• Text {PDF}

Accurate C-V Characterization of Quarter-Micron MOS Devices Using Quantum Mechanical Corrections and AC Simulation (IEDMS '96 - Hsinchu, Taiwan, Dec. 1996)
- Yu, Griffin, Dutton, Voorde, Oh

• Text {POSTSCRIPT, PDF}

2/3D Etching and Deposition Simulation Tools Implemented with a General TCAD Geometry Server (TECHCON '96 - Sept. 1996)
-Hsiau, Kan, McVittie, Dutton

• Text {POSTSCRIPT}

Modeling and Characterization of Three-Dimensional Effects in Physical Etching and Deposition Simulation (SISPAD '96 - Sept. 1996)
- Hsiau, Kan, Bang, McVittie, Dutton

• Text {Part 1, Part 2}

Efficient 3D Mesh Adaptation in Diffusion Simulation (SISPAD '96 - Sept. 1996)
- Chen, Yergeau, Dutton

• Text {POSTSCRIPT}

Back to the Top

1995

Physical Etching/Deposition Simulation with Collision-Free Boundary Movement (IEDM '95 - Dec. 1995)
- Hsiau, Kan, McVittie, Dutton

• Text {POSTSCRIPT}

Hierarchical Process Simulation for Nano-Electronics (IWCE '95 - Oct. 1995)
- Dutton, Kan

• Text {POSTSCRIPT}

ALAMODE: A Layered Architecture for Model Development (SISDEP '95 - Sept. 1995)
- Yergeau, Kan, Gander, Dutton

• Text {POSTSCRIPT}

Back to the Top

1994

Layout-based Extraction of IC Electrical Behavior Models (IEDM Software Showcase - Dec. 1994)
- Wang, Rotella, Chen, Yang, Lee, Yu, Knepper, Watt, Dutton

• Text {POSTSCRIPT}

Next Generation Stanford TCAD---PISCES 2ET and SUPREM OO7 (IEDM Software Showcase - Dec. 1994)
- Beebe, Rotella, Sahul, Yergeau, McKenna, So, Yu, Wu, Kan, McVittie, Dutton

• Text {POSTSCRIPT}

Grid Evolution for Oxidation Simulation Using a Quadtree Based Grid Generator (NUPAD V Conference - June 1994)
- Sahul, McKenna, Dutton

• Text {POSTSCRIPT}

Back to the Top

1993

Grid and Geometry Techniques for Multi-Layer Process Simulation (SISDEP '93 Conf. - Sept. 1993)
- Sahul, Dutton, Noell

• Text {POSTSCRIPT}

The Effects of High-Dose Silicon Implants on Boron Diffusion (TECHCON '93 - Sept. 1993)
-Huang, Dutton

SUPREM-IV.GS - Two Dimensional Process Simulation for Silicon and Gallium Arsenide
- Hansen, Deal

• Text {POSTSCRIPT}

Other publications on grid generation