Contractor: Stanford University
Agreement Number: F30602-96-2-0308
Project Number: HJ1500-3221-0599
DARPA Order Number: N-7-0504/AO E117/12
Contract Period: September 13, 1996 - September 12, 1999
Sponsor: Department of the Air Force
Technical POC: Robert W. Dutton
a) enhanced gridding capabilities compatible with VLSI TCAD.
b) object-oriented design of layered access to model definition
that allows fast prototyping of new and realistic physical
and constitutive models.
c) enhanced element technology for discretization of multi-physics
system of equations.
d) fully-integrated MEMS fabrication and device simulation
with detailed material and stress analyses monitored by
the test MEMS structure discussed below.
e) development of lumped models for specific MEMS applications
of interest to DARPA.
3) PROGRESS:
a) 3D tetrahedra mesh for the microswitch has been generated from
Stanford's TCAD gridder (CAMINO) based on the oct-tree algorithm.
The geometry has been parametrized to investigate performance
tradeoffs. Presently the geometry is described by boundary
representation, and ongoing discussion has been started on
geometry representation for composite CAD (tiger team).
b) Two dial-an-operator PDE solvers initially designed for
semiconductor process simulation (ALAMODE from Stanford and
PROPHET from Lucent) had been connected to CAMINO. Efforts on
prototyped capabilities for the electrostatic and isotropic-elastic
models for MEMS devices have started.
c) A unified grid representation for the multi-physics systems
is considered to avoid manual grid generation and
error (or even instability) from interpolation. Several
techniques for less stiff mechanical systems on tetrahedral
elements have been investigated.
d) The residual stress from fabrication modeled by conventional
TCAD (Stanford's SUPREM for oxidation and SPEEDIE for etching and
deposition) can be transferred to the PDE solvers in (b) by
the SWR (Semiconductor Wafer Representation) field server. Schemes
for tracking boundary movement and stress evolution simultaneously
are under investigation.
e) A two-lump compact model for the MEMS microswitch has been
constructed that can account for the effects of inertia,
viscoelasticity, the actuating circuit and residual stress.
Parameter extraction from electrical measurements
is described. Device characteristics (both static and dynamic)
and geometrical scaling are successfully modeled. Design
tradeoffs between actuating voltage and switching time
are clearly identified.
Develop extraction schemes of materials properties using in-situ test MEMS structures, in combination with the CAD tools developed above, to support predictive modeling. The scope of material characterization includes the use of multilayer and graded structures reliability issues such as fracture and fatigue. This closed-loop process of test structures, simulation and extraction/validation of models is the key link between groups in CAD/Material Science/MEMS developers.
2) APPROACH:
a) mechanical characterization of MEMS materials with dependencies
on processing and microstructure.
b) reliability study including fracture and fatigue.
c) feedback to the constitutive models in the FEM-based solver in
Task 1.
3) PROGRESS:
a) reliability subtask regarding fatigue has been studied and
determined that interaction of the constitutive pieces
required results of other task (this subtask now on hold).
b) test structure work:
Design and implementation of MEMS structures for in-situ materials parameter extraction mentioned above, which will be applicable to MEMS devices of interest to DARPA. The experimental measurements made with these structures will facilitate the critical evaluation of models, parameters and overall simulation accuracy for MEMS devices. The geometry and process flow design will support not only the application side (such as micromachined RF switches) but also the underlying need to quantify and understand MEMS device limits resulting from materials and process dependences.
2) APPROACH:
a) design and implementation of in-situ test structures.
b) design and implementation of example prototype MEMS device.
c) measurement, parameter extraction, modeling and testing.
3) PROGRESS:
a) TI interaction (MAFET) provides: