Hwasik Park

He worked on telecommunication technology for Korea Telecom Research Center, Seoul, Korea, from 1986 to 1989, and was with IBM Thomas J. Watson Research Center, Yorktown Heights, NY, from May 1991 to August 1991, where he worked on HBT process simulation as a research fellow. Since 1993, he has been with Stanford University where he is working on three-dimensional silicon process modeling and simulation as a postdoctoral research affiliate.

He is a member of IEEE, Korea Institute of Electronics Engineering(KIEE) and Korean Vacuum Society.

Current Research : 3D LOCOS Modeling

• 3D Numerical Oxidants Diffusion Solver
• Pseudo Numerical Approach for Sub-Micron LOCOS Structure
• Biharmonic Eq. Solver for 3D Nitride Stress

Research Interests

• 3D Monte-Carlo Simulation of Ion Implantation
• 3D Oxidation Simulation
• Extrinsic/Coupled Diffusion Physics and Modeling
• TCAD Framework
• Equipment Modeling and Design

Major Publications

1. Hwasik Park, A Study on the MOSFET Modeling using Boundary Element Method, M.S. Thesis, Chung Ang University, Seoul, Korea, Feb. 1986.
2. Hwasik Park, Donghwa Yu, Youngjin Song, Hojung Hwang," A Study on the Simulation of Interconnection Capacitance Caculation for VLSI," J. KIEE, Vol.29-B, No.1, pp.25-32, Jan. 1992.
3. Hyunwook Song, Hwasik Park, et al,"Development of Simulator for the Design of Optimal FIB Lens Structure," J. Korean Vacuum Society, Vol.1, No.2, pp.269-276, Feb. 1992.
4. Hwasik Park, Hojung Hwang," Development of Two-dimensional Silicon Oxidation Simulator using SVP Algorithm," J. KIEE, Vol. 29-A, No.12, pp.101-109, Dec. 1992.
5. Hwasik Park, Multi-dimensional Effects in ULSI Semiconductor Process - Theory and Simulation, Dissertation, Chung Ang Univ., 1993
6. Hwasik Park, Junha Lee, Hojung Hwang," Three-dimensional Ion Implantation Simulator using Analytical Models," J. KITE, Dec. 1993.
7. Hwasik Park, Peter Smeys, Peter Griffin, Zakir H. Sahul, Krishna C. Saraswat, Robert W. Dutton, and Hojung Hwang, "Quasi-3D Modeling of Sub-Micron LOCOS Structures," IEEE Trans. on Semiconductor Manufacturing, Nov. 1995, will be published.