He has been a Scientific Officer for the Services Electronics Research Laboratory and a Senior Scientific Officer with the UK Atomic Energy Authority Industrial Group in Culcheth, Lancashire, England.
In 1958 Reginald moved to the United States and began work for the Philco Corporation. In 1960 he moved to IBM Research where he worked until his retirement in 1992. At that time he joined Stanford University as a Senior Research Associate.
His research topics have included growth of crystals from the vapor phase by chemical vapor deposition; gaseous diffusions; semiconductors; surfaces; silicon device processing; diffusion technology development; material analysis by MeV helium ion backscattering; plasma etching; and semiconductor process modeling (ion implantation and diffusion).
He has authored or co-authored several papers in the area of process modeling and semiconductors. He is a member of the American Physical Society.
Reginald Lever (lever@gloworm.Stanford.EDU)